Carbon tetrafluoride (CF4) is a colorless, odorless flammable with relative molecular mass of 88, melting point of 183.6℃, boiling point of 127.8℃. At room temperature, CF4 is a compressible gas with high volatility, it is one of the most stable organic compounds and does not dissolve in water. When carbon tetrafluoride burns with combustible gas, it will decompose to generate toxic fluoride. Carbon tetrafluoride has important application in microelectronics industry. Carbon tetrafluoride has been used as a dielectric material for etching silicon dioxide and silicon nitride for many years, it is also the largest dosage of plasma etching gas in the microelectronics industry at present.
Carbon tetrafluoride is the largest dosage of plasma etching gas in the microelectronics industry at present. The mixture of carbon tetrafluoride and high purity nitrogen can be widely used in etch of silicon, silicon dioxide, silicon nitride, phosphoro-silicate glass and thin film materials of tungsten. At the same time, carbon tetrafluoride can be used as cryogenic fluid at low temperature, and it also can be applicated in the fields of refrigeration, gas insulation, fluridizer, surface treating agent and inspection agent of laser gas leakage.
Carbon tetrafluoride is stored in standard seamless cylinders, the packing specifications include 8L, 44L and 47L respectively. Specific packaging specifications can be customized according to user requirements. Carbon tetrafluoride is stored in a shady and ventilated storeroom away from fire and heat source, temperature of storeroom does not exceed 30℃. It should be separately stored with inflammable (combustible) and oxidizing agent. The storage area should be equipped with emergency equipment for emergency.